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1

[Springer Proceedings in Mathematics & Statistics] Recent Advances in Mathematical and Statistical Methods Volume 259 (IV AMMCS International Conference, Waterloo, Canada, August 20–25, 2017) || Using Social Media to Improve Knowledge Sharing among Healthcare Practitioners

Kilgour, D. Marc, Kunze, Herb, Makarov, Roman, Melnik, Roderick, Wang, Xu

Year:

2018

Language:

english

File:

PDF, 382 KB

english, 2018

2

[Springer Proceedings in Mathematics & Statistics] Recent Advances in Mathematical and Statistical Methods Volume 259 (IV AMMCS International Conference, Waterloo, Canada, August 20–25, 2017) || Dynamical Analysis of a Modified Prey-Predator Model for Venture Capital Investment

Kilgour, D. Marc, Kunze, Herb, Makarov, Roman, Melnik, Roderick, Wang, Xu

Year:

2018

Language:

english

File:

PDF, 315 KB

english, 2018

3

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes) containing acetal groups

Park, Joo Hyeon, Kim, Seong-Ju, Kim, Ji-Hong, Seo, Dong-Chul, Kim, Ki-Dae, Park, Sun-Yi, Lee, Hosull, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 270 KB

english, 1996

4

Transparent fluids for 157-nm immersion lithography

Kunz, Roderick R.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2004

Language:

english

File:

PDF, 159 KB

english, 2004

5

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Examination of isolated and grouped feature bias in positive-acting chemically amplified resist systems

Petersen, John S., Byers, Jeff D., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 432 KB

english, 1996

6

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Highly absorbing ARC for DUV lithography

Pavelchek, Edward K., Meador, James D., Guerrero, Douglas J., Lamb III, James E., Kache, Ajit, doCanto, Manuel, Adams, Timothy G., Stark, David R., Miller, Daniel A., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 576 KB

english, 1996

7

Mathematical and Computational Approaches in Advancing Modern Science and Engineering || Numerical Investigation on Periodic Simulation of Flow Through Ducted Axial Fan

Bélair, Jacques, Frigaard, Ian A., Kunze, Herb, Makarov, Roman, Melnik, Roderick, Spiteri, Raymond J.

Year:

2016

Language:

english

File:

PDF, 737 KB

english, 2016

8

Mathematical and Computational Approaches in Advancing Modern Science and Engineering || Solutions of Time-Fractional Diffusion Equation with Reflecting and Absorbing Boundary Conditions Using Matlab

Bélair, Jacques, Frigaard, Ian A., Kunze, Herb, Makarov, Roman, Melnik, Roderick, Spiteri, Raymond J.

Year:

2016

Language:

english

File:

PDF, 281 KB

english, 2016

9

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Application of photodecomposable base concept to two-component deep-UV chemically amplified resists

Funato, Satoru, Kunz, Roderick R., Kawasaki, N., Kinoshita, Yoshiaki, Masuda, Seiya, Okazaki, Hiroshi, Padmanaban, Munirathna, Yamamoto, T., Pawlowski, Georg

Year:

1996

Language:

english

File:

PDF, 903 KB

english, 1996

10

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Substrate effect in chemically amplified resist

Mori, Shigeyasu, Watanabe, Takeo, Adachi, Kouichirou, Fukushima, Takashi, Uda, Keichiro, Sato, Yuichi, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 396 KB

english, 1996

11

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

Onishi, Yasunobu, Sato, Kazuo, Chiba, Kenzi, Asano, Masafumi, Niki, Hirokazu, Hayase, Rumiko H., Hayashi, Takao, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 1.19 MB

english, 1996

12

Mathematical and Computational Approaches in Advancing Modern Science and Engineering || A Dual-Rotor Horizontal Axis Wind Turbine In-House Code (DR_HAWT)

Bélair, Jacques, Frigaard, Ian A., Kunze, Herb, Makarov, Roman, Melnik, Roderick, Spiteri, Raymond J.

Year:

2016

Language:

english

File:

PDF, 361 KB

english, 2016

13

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Immersion liquids for lithography in the deep ultraviolet

Switkes, Michael, Yen, Anthony, Kunz, Roderick R., Sinta, Roger F., Rothschild, Mordechai, Gallagher-Wetmore, Paula M., Krukonis, Val J., Williams, Kara

Year:

2003

Language:

english

File:

PDF, 631 KB

english, 2003

14

High-sensitivity detection of trace gases using dynamic photoacoustic spectroscopy

Wynn, Charles M., Palmacci, Stephen, Clark, Michelle L., Kunz, Roderick R.

Journal:

Optical Engineering

Year:

2013

Language:

english

File:

PDF, 1.73 MB

english, 2013

15

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - 193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system

Allen, Robert D., Wallraff, Gregory M., Di Pietro, Richard A., Hofer, Donald C., Kunz, Roderick R., Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 1.23 MB

english, 1995

16

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Optical/Laser Microlithography VIII - 193-nm full-field step-and-scan prototype at MIT Lincoln Laboratory

Hibbs, Michael S., Kunz, Roderick R., Brunner, Timothy A.

Year:

1995

Language:

english

File:

PDF, 418 KB

english, 1995

17

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Application of DNQ-based microlithography to patterning bioactive molecules and cells

Nicolau, Dan V., Taguchi, Takahisa, Taniguchi, Hiroshi, Yoshikawa, Susumu, Dusa, Mircea V., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 905 KB

english, 1996

18

[Springer Proceedings in Mathematics & Statistics] Recent Advances in Mathematical and Statistical Methods Volume 259 (IV AMMCS International Conference, Waterloo, Canada, August 20–25, 2017) ||

Kilgour, D. Marc, Kunze, Herb, Makarov, Roman, Melnik, Roderick, Wang, Xu

Year:

2018

Language:

english

File:

PDF, 18.36 MB

english, 2018

19

Mathematical and Computational Approaches in Advancing Modern Science and Engineering || Modelling an Aquaponic Ecosystem Using Ordinary Differential Equations

Bélair, Jacques, Frigaard, Ian A., Kunze, Herb, Makarov, Roman, Melnik, Roderick, Spiteri, Raymond J.

Year:

2016

Language:

english

File:

PDF, 179 KB

english, 2016

20

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Deep-UV hardening of deep-UV resists

Jordhamo, George M., Moreau, Wayne M., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 327 KB

english, 1996

21

[Springer Proceedings in Mathematics & Statistics] Recent Advances in Mathematical and Statistical Methods Volume 259 (IV AMMCS International Conference, Waterloo, Canada, August 20–25, 2017) || Robust Reliable $$H_{\infty }$$ Control and Input-to-State Stabilization for Uncertain Hybrid Systems

Kilgour, D. Marc, Kunze, Herb, Makarov, Roman, Melnik, Roderick, Wang, Xu

Year:

2018

Language:

english

File:

PDF, 736 KB

english, 2018

22

Acid-catalyzed single-layer resists for ArF lithography

Kunz, Roderick R.

Journal:

Optical Engineering

Year:

1993

Language:

english

File:

PDF, 557 KB

english, 1993

23

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Narrow polydispersity polymers for microlithography: synthesis and properties

Barclay, George G., Hawker, C. J., Ito, Hiroshi, Orellana, Arturo J., Malenfant, P. R., Sinta, Roger F., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 371 KB

english, 1996

24

[Springer Proceedings in Mathematics & Statistics] Recent Advances in Mathematical and Statistical Methods Volume 259 (IV AMMCS International Conference, Waterloo, Canada, August 20–25, 2017) || A General Method for Selection Function Optimization in Genetic Algorithms

Kilgour, D. Marc, Kunze, Herb, Makarov, Roman, Melnik, Roderick, Wang, Xu

Year:

2018

Language:

english

File:

PDF, 310 KB

english, 2018

25

Engineering synthetic breath biomarkers for respiratory disease

Chan, Leslie W., Anahtar, Melodi N., Ong, Ta-Hsuan, Hern, Kelsey E., Kunz, Roderick R., Bhatia, Sangeeta N.

Journal:

Nature Nanotechnology

Year:

2020

File:

PDF, 3.57 MB

2020

26

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Design and properties of new deep-UV positive photoresist

Choi, Sang-Jun, Jung, Si-Young, Kim, Chang-Hwan, Park, Choon-Geun, Han, Woo-Sung, Koh, Young-Bum, Lee, Moon-Yong, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 288 KB

english, 1996

27

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Calibration of chemically amplified resist models

Byers, Jeff D., Petersen, John S., Sturtevant, John L., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 127 KB

english, 1996

28

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Reduction of substrate dependency of chemically amplified resist

Chun, Jun-Sung, Bok, Cheol-Kyu, Baik, Ki-Ho, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 872 KB

english, 1996

29

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Using scanning electrochemical microscopy to probe chemistry at the solid-liquid interface in chemically amplified immersion lithography

LeSuer, Robert J., Fan, Fu-Ren F., Bard, Allen J., Taylor, J. Christopher, Tsiartas, Pavlos, Willson, Grant, Conley, Willard E., Feit, Gene, Kunz, Roderick R., Sturtevant, John L.

Year:

2004

Language:

english

File:

PDF, 1.04 MB

english, 2004

30

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - High-throughput process optimization using the EZ technique

Toukhy, Medhat A., Schlicht, Karin R., Morra, Patricia, Chanthalyma, Somboun, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 1.01 MB

english, 1996

31

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Halation reduction for single-layer DUV resist processing

Yoshino, Hiroshi, Itani, Toshiro, Hashimoto, Shuichi, Yamana, Mitsuharu, Samoto, Norihiko, Kasama, Kunihiko, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 638 KB

english, 1996

32

Mathematical and Computational Approaches in Advancing Modern Science and Engineering || Bifurcations in the Solution Structure of Market Equilibrium Problems

Bélair, Jacques, Frigaard, Ian A., Kunze, Herb, Makarov, Roman, Melnik, Roderick, Spiteri, Raymond J.

Year:

2016

Language:

english

File:

PDF, 384 KB

english, 2016

33

Mathematical and Computational Approaches in Advancing Modern Science and Engineering || Application of CFD Modelling to the Restoration of Eutrophic Lakes

Bélair, Jacques, Frigaard, Ian A., Kunze, Herb, Makarov, Roman, Melnik, Roderick, Spiteri, Raymond J.

Year:

2016

Language:

english

File:

PDF, 382 KB

english, 2016

34

Rapid Quantitative Analysis of Multiple Explosive Compound Classes on a Single Instrument via Flow-Injection Analysis Tandem Mass Spectrometry

Ostrinskaya, Alla, Kunz, Roderick R., Clark, Michelle, Kingsborough, Richard P., Ong, Ta-Hsuan, Deneault, Sandra

Journal:

Journal of Forensic Sciences

Year:

2018

Language:

english

File:

PDF, 395 KB

english, 2018

35

Theoretical Bounds on Electron Energy Filtering in Disordered Nanomaterials

Dodin, Amro, Aull, Brian, Kunz, Roderick R., Willard, Adam P.

Journal:

Year:

2019

Language:

english

File:

PDF, 1.20 MB

english, 2019

36

193 nm resists and lithography

Roderick R. Kunz, Robert D. Allen, Mark A. Hartney, William D. Hinsberg, Mark W. Horn, Craig L. Keast, Mordechai Rothschild, David C. Shaver, Gregory M. Wallraff

Journal:

Polymers for Advanced Technologies

Year:

1994

Language:

english

File:

PDF, 2.35 MB

english, 1994

37

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Limits to etch resistance for 193-nm single-layer resists

Kunz, Roderick R., Palmateer, Susan C., Forte, Anthony R., Allen, Robert D., Wallraff, Gregory M., Di Pietro, Richard A., Hofer, Donald C., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 773 KB

english, 1996

38

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Performance of a phase-shift focus monitor reticle designed for 193-nm use

Kunz, Roderick R., Chan, M. S., Doran, Scott P., Van den Hove, Luc

Year:

1999

Language:

english

File:

PDF, 500 KB

english, 1999

39

Mathematical and Computational Approaches in Advancing Modern Science and Engineering ||

Bélair, Jacques, Frigaard, Ian A., Kunze, Herb, Makarov, Roman, Melnik, Roderick, Spiteri, Raymond J.

Year:

2016

Language:

english

File:

PDF, 22.89 MB

english, 2016

40

Mathematical and Computational Approaches in Advancing Modern Science and Engineering || The Impact of Movement on Disease Dynamics in a Multi-city Compartmental Model Including Residency Patch

Bélair, Jacques, Frigaard, Ian A., Kunze, Herb, Makarov, Roman, Melnik, Roderick, Spiteri, Raymond J.

Year:

2016

Language:

english

File:

PDF, 176 KB

english, 2016

41

Mathematical and Computational Approaches in Advancing Modern Science and Engineering || Homoclinic Structure for a Generalized Davey-Stewartson System

Bélair, Jacques, Frigaard, Ian A., Kunze, Herb, Makarov, Roman, Melnik, Roderick, Spiteri, Raymond J.

Year:

2016

Language:

english

File:

PDF, 1.44 MB

english, 2016

42

[Springer Proceedings in Mathematics & Statistics] Recent Advances in Mathematical and Statistical Methods Volume 259 (IV AMMCS International Conference, Waterloo, Canada, August 20–25, 2017) || Exact Coloring of Sparse Matrices

Kilgour, D. Marc, Kunze, Herb, Makarov, Roman, Melnik, Roderick, Wang, Xu

Year:

2018

Language:

english

File:

PDF, 289 KB

english, 2018

43

Silicon hydride etch products from the reaction of atomic hydrogen with Si(100)

Stephen M. Gates, Roderick R. Kunz, C.Michael Greenlief

Journal:

Surface Science

Year:

1989

Language:

english

File:

PDF, 1.40 MB

english, 1989

44

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Latitude of the BAR process compared to the monolayer and TAR processes for 0.35-μm design rules at gate level

Andre, Sandrine, Weill, Andre P., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 446 KB

english, 1996

45

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Photosensitization in dyed and undyed APEX-E DUV resist

Sturtevant, John L., Conley, Will, Webber, Stephen E., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 573 KB

english, 1996

46

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - New process for resist removal after lithography process using adhesive tape

Kubozono, Tatsuya, Moroishi, Yutaka, Ohta, Yoshio, Shimodan, Hideaki, Moriuchi, Noboru, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 806 KB

english, 1996

47

Fluoroaromatic Resists for 157-nm Lithography.

Fedynyshyn, Theodore H., Kunz, Roderick R., Sinta, Roger F., Sworin, Michael, Mowers, William A., Goodman, Russell B., Cabral, Alberto

Journal:

Journal of Photopolymer Science and Technology

Year:

2002

Language:

english

File:

PDF, 2.01 MB

english, 2002

48

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Photoresist outgassing: a potential Achilles heel for short-wavelength optical lithography?

Kunz, Roderick R., Sturtevant, John L.

Year:

2004

Language:

english

File:

PDF, 328 KB

english, 2004

49

Plasma-deposited silylation resist for 193 nm lithography

Horn, Mark W., Rothschild, Mordechai, Maxwell, Brian E., Goodman, Russell B., Kunz, Roderick R., Eriksen, Lynn M.

Journal:

Applied Physics Letters

Year:

1996

Language:

english

File:

PDF, 334 KB

english, 1996

50

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography

Wallow, Thomas I., Houlihan, Francis M., Nalamasu, Omkaram, Chandross, Edwin A., Neenan, Thomas X., Reichmanis, Elsa, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 895 KB

english, 1996

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